There is no replacement for this OBSOLETE element. SIGCMOSX models section of single microstrip line arranged inside the layer of silicon oxide over the conducting silicon substrate. This model is constructed as an EM Based (Table Based Interpolation) model using the results of a 2D Finite Element Method analysis. Applicability of this model is limited to several predefined configurations.
|W||Width of conductor||Length||W|
|HS||Stack height of signal conductor above boundary oxide/substrate||W|
|*AutoFill||AutoFill dataBase if not equal to 0||0|
* indicates a secondary parameter
MSUB2. Two-layer substrate parameters are listed in MSUB2 model description. Note that all MSUB2 parameters are fixed parameters (see Implementation Details section below) and must be set by user in accordance with the table in the section Parameter Restrictions and Recommendations).
W. Parameter W is independent parameter, that is, in can be set to any value within the specified limits (see section Parameter Restrictions and Recommendations).
HS. Stack height of metal level the conductor belongs to is a fixed parameter. It must be set to one of the predefined values listed in the table in the section Parameter Restrictions and Recommendations.
AutoFill. Secondary parameter which in vast majority of EM Based models controls the initiation of the Autofill operation; in these models AutoFill allows the user to specify that the entire interpolation table should be filled automatically at the current values. To instigate this filling process, this parameter should be set to one (1). During normal operation, this parameter should be set to zero (0). Access to the hidden parameter can be accomplished by double-clicking on the schematic element. This model keeps Autofill just for consistency sake: the current version of SIGCMOSX does not accept AutoFill=1 so Autofill must always be equal to zero.
Substrate parameters T, Sig2 and model parameter HS must belong to one of five predefined sets presented in the following table:
|1||0.31 micron||1.11 micron||7.41 S/m|
|2||0.31 micron||3.75 micron||7.41 S/m|
|3||1.25 micron||9 micron||7.41 S/m|
|4||4.0 micron||13.65 micron||7.41 S/m|
|5||4.0 micron||13.65 micron||0|
The rest of substrate parameters must be set to the following values:
H2 = 6 microns
Er1 = 4.1
Er2 = 11.9
Tand1 = 0
Tand2 = 0
Rho = 1.19
Model parameter W should be within 1.5 microns <W<28.5 microns. Model extrapolates results outside this interval.
Frequency range is recommended 0.5 GHz<f<106 GHz. Model extrapolates results outside this interval.
No limitations on parameter L.
This model is constructed as an EM-Based model (table Based Interpolation) using the results of a 2-D cross-sectional analysis based upon the Finite Elements Method. For a more detailed discussion of the EM-Based models see “ EM-based Models (X-models) ” (Element Catalog Supplementary Information).
This element does not have an assigned layout cell. You can assign artwork cells to any element. See “Assigning Artwork Cells to Layout of Schematic Elements” for details.
NOTE: Default values of substrate parameters are not acceptable for this model; after placing the new substrate instance on the schematic user must set substrate parameters to the allowed values.
This model was developed under research performed at Cadence Design Systems, Inc. The full set of details of the implementation are considered proprietary in nature.